W.M. Keck Photonic Laboratory
The W.M. Keck Photonic Laboratory is a 5000 sq.ft. class 100
cleanroom facility. This dedicated research lab houses standard
device fabrication tools such as photolithography, wet and dry
etching, metal and dielectric deposition, oxidation and diffusion.
In addition, the lab features newly acquired electron beam
lithography prototyping capability to allow the definition of
features down to 30 nanometers, and an electron cyclotron etching
system with laser interferometric control that allows the control of
etching depth to a few atomic layers. The facilities have been used
to fabricate the latest devices in several technologies and to
explore new devices with feature sizes as small as 40 nanometers. A
lab manager runs the facility.
Keck Lab website